AWARD INFORMATION
With a focus on optical tooling and/or semiconductor manufacturing methods, the BACUS Scholarship is given to a full-time undergraduate or graduate student majoring in microlithography. BACUS, the International Technical Group of SPIE committed to the development of photomask technology, is the sponsor of this fellowship. should belong to SPIE.ELIGIBILITY REQUIREMENTS
Minimum GPA
None specified
Ethnicity / Heritage
None specified
Residency
None specified
Gender
None Specified
Religious Affiliation
None specified
School Location
None
Area of Study
None specified
Financial Need
Financial need analysis is not required
SCHOLARSHIP SPONSOR
Organization
International Society for Optical Engineering-SPIE
Address
SPIE Scholarship Committee Team
Telephone
Email
Website